# HS Code for focused ion beam (fib) lithography and patterning/milling tool designed primarily for use in semiconductor manufacturing

Source: https://www.findhs.codes/hs-code-for-focused-ion-beam-fib-lithography-and-patterning-milling-tool-designed-primarily-for-use-in-semiconductor-manufacturing

> The 6-digit HS code for focused ion beam (fib) lithography and patterning/milling tool designed primarily for use in semiconductor manufacturing is 8486.20. The first 6 digits are the same in every country using the Harmonized System; the full 8-10 digit national code (e.g. EU TARIC, US HTSUS) depends on the destination country.

## HS codes (6-digit)

| HS Code (6-digit) | Description | Sample product |
|---|---|---|
| 8486.20 |  | focused ion beam nanofabrication system |

Full national tariff codes (8-10 digits, e.g. EU TARIC, US HTSUS, UK, China, Japan, India, Turkey) and applicable customs duty rates are available on https://www.findhs.codes/hs-code-for-focused-ion-beam-fib-lithography-and-patterning-milling-tool-designed-primarily-for-use-in-semiconductor-manufacturing for registered users.